AAAR 33rd Annual Conference
October 20 - October 24, 2014
Rosen Shingle Creek
Orlando, Florida, USA
Abstract View
Evaluation of Nano-sized Silica Size Standards
SHIGERU KIMOTO, William Dick, David Y. H. Pui, Daryl Roberts, University of Minnesota
Abstract Number: 245 Working Group: Instrumentation and Methods
Abstract In this study, we evaluated a new series of nano-sized silica particle suspensions synthesized with modal diameters in the size range 20-200 nm. These silica particles are primarily used as size standards for calibration of wafer surface scanning devices in semiconductor industries. To be used as size standards, important microphysical properties of the particles must be known. Therefore, we characterized the nanosized silica particles in terms of size, effective density, and refractive index. We used calibration procedures developed by the National Institute of Advanced Industrial Science and Technology (AIST) in Japan in our evaluation methods for size and effective density measurements, made with the Scanning Mobility Particle Sizer (SMPS) (TSI, Model 3080) and the Aerosol Particle Mass Analyzer (APM) (Kanomax, APM-II). For refractive index measurements, we used a laser particle counter (LPC). We will report details for this study.