10th International Aerosol Conference September 2 - September 7, 2018 America's Center Convention Complex St. Louis, Missouri, USA
Abstract View
Synthesis of Nanoparticle-embedded Composite Films by Plasma-enhanced CVD Process Using Gaseous and Particulate Raw Materials
MANABU SHIMADA, Masaru Kubo, Yuki Shigematsu, Izumo Shimada, Hiroshima University
Abstract Number: 422 Working Group: Materials Synthesis
Abstract Nanocomposite films consisting of different species are attracting interest, because of the integrated or synergistic properties of the species. Among these, thin films with embedded nanoparticles are promising materials for many applications. The properties of the embedded nanoparticles, such as size and quantity, should sufficiently be controlled in order for desired properties to emerge. One of the beneficial ways to control the properties is to use pre-formed nanoparticles. In this study, nanocomposite films in which silicon dioxide (SiO2) nanoparticles and carbon nanotubes (CNTs) are embedded in titanium dioxide (TiO2) matrix are synthesized by a combination of a spray-drying aerosolization technique and plasma-enhanced chemical vapor deposition (PECVD).
TiO2 matrix is synthesized by feeding titanium tetraisopropoxide (TTIP) vapor in a microwave plasma field. An SiO2 nanoparticle or CNT suspension is sprayed into the plasma field simultaneously, in which the sprayed droplets are electrically charged and broken-up by Coulomb explosion to generate an aerosol with well-dispersed nanoparticles. This simultaneous feeding of the vapor and nanoparticle aerosol produces the nanocomposite films on silicon and quartz-glass substrates by PECVD. The concentration and size of the nanoparticles in the suspension influenced the morphology and inner structure of the films. Quantitative evaluation of the surface roughness of the films reveals the roughness formation due to the embedded nanoparticles. The photocatalytic activities of the films are found to be enhanced, as compared to that of a TiO2 film, probably because of the increase in the surface area of the films due to the roughness.