Abstract View
Characterization of Airborne Nanoparticulate Matter in Semiconductor Manufacturing Environments
ZHAOBO ZHANG, Pierre Herckes, Paul Westerhoff, Arizona State University
Abstract Number: 619
Working Group: Aerosol Exposure
Abstract
Occupational exposure to airborne nanoparticles in semiconductor fabrication facilities is of emerging concern and has only recently been addressed in a few studies. To date, there is limited information on the airborne concentrations, the source or the physical and chemical properties of nanoparticles in these environments and potential worker exposure.
We will present initial findings from observations in a research and a pilot plant manufacturing facility. Filter samples were collected for offline analysis using Transmission Electron Microscopy and Inductively Coupled Plasma Mass Spectrometry, to determine the size, shape, and elemental concentration of collected nanoparticles. A Scanning Mobility Particle Sizer was used to monitor size resolved airborne nanoparticle concentrations during routine tool operations and maintenance activities. The results show low but measurable concentrations of nanosized particles in the clean rooms investigated during normal operations. Select maintenance operations, particularly on plasma-enhanced chemical vapor deposition tools, let to substantial particle concentrations (1000s /cc), most in the sub 20nm range. The particles appear to mainly be silicate although nanoparticulate metallic particles were also observed during the studies. A complete discussion of these results will be provided.