AAAR 35th Annual Conference October 17 - October 21, 2016 Oregon Convention Center Portland, Oregon, USA
Abstract View
A Study of Hydrogen Assisted Spark Discharge for Generating Hydrogen Passivated Silicon Nanoparticles with High Crystallinity
DONGJOON LEE, Kiwoong Lee, Dae Seong Kim, Jong-Kwon Lee, Sei Jin Park, Mansoo Choi, Global Frontier Center for Multiscale Energy Systems
Abstract Number: 402 Working Group: Nanoparticles and Materials Synthesis
Abstract The purity control over nanoparticles is significantly important in the particle generation process, and their crystallinity and surface chemistry play a crucial role for enhancing the performance in nanoparticle-embedded opto- and nano-electronic devices. In this study, we investigate the effect of the hydrogen gas on production of the silicon nanoparticles via spark discharge generation process. When we use argon as a carrier gas, a small amount of the oxygen gas causes the generation of silicon oxide particles, and the spark energy is insufficient to produce high-crystalline silicon nanoparticles. By introducing hydrogen gas, the inert atmosphere in the spark discharge generator is converted into a reducing atmosphere, which effectively eliminated the oxygen gas in the spark discharge generator. The purity of generated silicon nanoparticles gradually enhanced as the portion of hydrogen gas increased. In addition, hydrogen plasma generated from the spark discharge process improves the crystallinity of the silicon nanoparticles. Moreover, as highly reactive hydrogen plasma interacts with dangling bonds on the surface of silicon nanoparticles, the surface of the silicon nanoparticles is passivated with the hydrogen atom. Thus, the suggested technique herein produces the hydrogen-passivated silicon nanoparticles with high crystallinity, which is applicable for generating silicon quantum dots with size-selection.